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Received: Jun. 14, 2018
Accepted: Jul. 25, 2018
Posted: May. 10, 2019
Published Online: May. 10, 2019
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Jie Chen, Jie Liu, Li Zhu, Xiao Deng, Xinbin Cheng, Tongbao Li. Optimization of Atom Flux in Atom Lithography[J]. Acta Optica Sinica, 2018, 38(12): 1202001
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Atomic and Molecular Physics
Acta Optica Sinica, Vol. 38, Issue 12, 1202001 (2018)
Optimization of Atom Flux in Atom Lithography
Chen Jie**, Liu Jie, Zhu Li, Deng Xiao*, Cheng Xinbin, and Li Tongbao
Author Affiliations
- School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
Abstract
Atom flux is one of the main factors influencing the quality of nano-gratings fabricated by atom lithography. Based on the theoretical model of eruption volume of atomic furnace tube, the atom flux levels for three typical kinds of furnace tubes are compared by the combination of theory and experiment. Moreover, with the best furnace tube configuration, the peak to valley height of the fabricated Cr nano-gratings increases up to 100 nm, which further optimizes the quality of nano-gratings.
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