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  • Received: Jun. 14, 2018

    Accepted: Jul. 25, 2018

    Posted: May. 10, 2019

    Published Online: May. 10, 2019

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    DOI: 10.3788/AOS201838.1202001

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    Jie Chen, Jie Liu, Li Zhu, Xiao Deng, Xinbin Cheng, Tongbao Li. Optimization of Atom Flux in Atom Lithography[J]. Acta Optica Sinica, 2018, 38(12): 1202001

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Acta Optica Sinica, Vol. 38, Issue 12, 1202001 (2018)

Optimization of Atom Flux in Atom Lithography

Chen Jie**, Liu Jie, Zhu Li, Deng Xiao*, Cheng Xinbin, and Li Tongbao

Author Affiliations

  • School of Physics Science and Engineering, Tongji University, Shanghai 200092, China

Abstract

Atom flux is one of the main factors influencing the quality of nano-gratings fabricated by atom lithography. Based on the theoretical model of eruption volume of atomic furnace tube, the atom flux levels for three typical kinds of furnace tubes are compared by the combination of theory and experiment. Moreover, with the best furnace tube configuration, the peak to valley height of the fabricated Cr nano-gratings increases up to 100 nm, which further optimizes the quality of nano-gratings.

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