Main > Chinese Optics Letters >  Volume 17 >  Issue 12 >  Page 121102 > Article
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  • Received: Apr. 24, 2019

    Accepted: Aug. 6, 2019

    Posted: Dec. 3, 2019

    Published Online: Dec. 3, 2019

    The Author Email: Yijiang Shen (yjshen@gdut.edu.cn)

    DOI: 10.3788/COL201917.121102

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    Yijiang Shen, Fei Peng, Xiaoyan Huang, Zhenrong Zhang. Adaptive gradient-based source and mask co-optimization with process awareness[J]. Chinese Optics Letters, 2019, 17(12): 121102

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Data from CrossRef

[1] Lufeng Liao, Sikun Li, Xiangzhao Wang, Libin Zhang, Pengzheng Gao, Yayi Wei, Weijie Shi. Critical pattern selection method for full-chip source and mask optimization. Optics Express, 28, 20748(2020).

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