Main > Chinese Optics Letters >  Volume 17 >  Issue 12 >  Page 121102 > Article
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  • Received: Apr. 24, 2019

    Accepted: Aug. 6, 2019

    Posted: Dec. 3, 2019

    Published Online: Dec. 3, 2019

    The Author Email: Yijiang Shen (yjshen@gdut.edu.cn)

    DOI: 10.3788/COL201917.121102

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    Yijiang Shen, Fei Peng, Xiaoyan Huang, Zhenrong Zhang. Adaptive gradient-based source and mask co-optimization with process awareness[J]. Chinese Optics Letters, 2019, 17(12): 121102

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  • Table 1. Wafer Stack Parameters

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    Table 1. Wafer Stack Parameters

    LayerIndexThickness (nm)
    Incident medium(1.45, 0)
    Top anti-reflection(1.55, 0.0)35
    Photoresist(1.8, 0.02)100
    Bottom anti-reflection(1.72, 0.33)87
    Substrate(0.833, 2.778)
  • Table 2. Spe, Sepe, and Spv of the Simulations in Figs. 5 and 6

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    Table 2. Spe, Sepe, and Spv of the Simulations in Figs. 5 and 6

     Fig. 5Fig. 6
    row I01(a)(b)(c)(d)
    Spe4494614540586490
    Sepe1158172175174143
    Spv23472246183422111885
  • Table 3. Spe, Sepe, and Spv of the Simulations in Figs. 5 and 8

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    Table 3. Spe, Sepe, and Spv of the Simulations in Figs. 5 and 8

     Fig. 5Fig. 8Fig. 5Fig. 8
    row I01(a)(b)row I02(c)(d)
    Spe4494567n.a.5193468n.a.
    Sepe1158178n.a.151296n.a.
    Spv23471867n.a.39652472n.a.

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