Main > Chinese Optics Letters >  Volume 13 >  Issue 9 >  Page 091404 > Article
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Accepted: Jun. 30, 2015

Posted: Jan. 23, 2019

Published Online: Sep. 14, 2018

The Author Email: Chaoyang Wei (siomwei@siom.ac.cn)

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Wenwen Liu, Chaoyang Wei, Kui Yi, Jianda Shao. Multiscale analysis of single- and multiple-pulse laser-induced damages in HfO2/SiO2 multilayer dielectric films at 532 nm[J]. Chinese Optics Letters, 2015, 13(9): 091404

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## Abstract

Nanosecond single- and multiple-pulse laser damage studies on $HfO2/SiO2$ high-reflection (HR) coatings are performed at 532 nm. For single-pulse irradiation, the damage is attributed to the defects and the electric intensity distribution in the multilayer thin films. When the defect density in the irradiated area is high, delamination is observed. Other than the 1064 nm laser damage, the plasma scalding of the 532 nm laser damage is not pits-centered for normal incidence, and the size of the plasma scalding has no relation to the defect density and position, but increases with the laser fluence. For multiple-pulse irradiations, some damage sites show deeper precursors than those from the single-shot irradiation due to the accumulation effects. The cumulative laser-induced damages behave as pits without the presence of plasma scalding, which is unaffected by the laser fluence and shot numbers. The damage morphologies and depth information both confirm the fatigue effect of a $HfO2/SiO2$ HR coating under 532 nm laser irradiation.