Main > Chinese Optics Letters >  Volume 13 >  Issue 9 >  Page 091404 > Article
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  • Received: Apr. 24, 2015

    Accepted: Jun. 30, 2015

    Posted: Jan. 23, 2019

    Published Online: Sep. 14, 2018

    The Author Email: Chaoyang Wei (siomwei@siom.ac.cn)

    DOI: 10.3788/COL201513.091404

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    Wenwen Liu, Chaoyang Wei, Kui Yi, Jianda Shao. Multiscale analysis of single- and multiple-pulse laser-induced damages in HfO2/SiO2 multilayer dielectric films at 532 nm[J]. Chinese Optics Letters, 2015, 13(9): 091404

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  • Lasers and Laser Optics
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