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  • Received: Jul. 1, 2019

    Accepted: Aug. 14, 2019

    Posted: Dec. 1, 2019

    Published Online: Dec. 6, 2019

    The Author Email: Zhao Di (

    DOI: 10.3788/AOS201939.1231001

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    Xiuhua Fu, Di Zhao, Cheng Lu, Guojun Ma, Ganghua Bao. Uniformity of Film Thickness Distribution for Single Evaporation Source[J]. Acta Optica Sinica, 2019, 39(12): 1231001

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Acta Optica Sinica, Vol. 39, Issue 12, 1231001 (2019)

Uniformity of Film Thickness Distribution for Single Evaporation Source

Fu Xiuhua1, Zhao Di1,*, Lu Cheng2, Ma Guojun1, and Bao Ganghua2

Author Affiliations

  • 1School of Optoelectronic Engineering, Changchun University of Science and Technology, Changchun, Jilin 130022, China
  • 2Chengdu Guotai Vacuum Equipment Co., Ltd., Chengdu, Sichuan 611130, China


A simplified polar coordinate method based on the non-cosine film thickness formula is proposed for characterizing film thickness distribution. Herein, control of the uniformity of optical film thickness formed by single source electron beam evaporation is studied. Simultaneously, the position of the mask plate is calculated. Compared to the traditional method of placing the mask directly above the evaporation source, the proposed polar coordinate method is used to calculate mask position, which is more conducive to controlling the uniformity of film thickness distribution. Considering an evaporated H4/MgF2 combination as an example, the mask positions and shapes of high and low refractive index materials are calculated, and single layer films are prepared using these two materials. The measured spectral uniformity deviation is better than 0.3%, thus demonstrating the correctness and feasibility of the proposed method.


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