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  • Received: Nov. 16, 2006

    Accepted: --

    Posted: Jun. 27, 2007

    Published Online: Jun. 27, 2007

    The Author Email: Junling Qin (qinjl@siom.ac.cn)

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    Junling Qin, Jianda Shao, Kui Yi, Zhengxiu Fan. Interface roughness, surface roughness and soft X-ray reflectivity of Mo/Si multilayers with different layer number[J]. Chinese Optics Letters, 2007, 5(5): 301

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Chinese Optics Letters, Vol. 5, Issue 5, 301 (2007)

Interface roughness, surface roughness and soft X-ray reflectivity of Mo/Si multilayers with different layer number

Junling Qin1,2,*, Jianda Shao1,2, Kui Yi1, and Zhengxiu Fan1

Author Affiliations

  • 1Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800
  • 2Graduate School of the Chinese Academy of Sciences, Beijing 100039

Abstract

A series of Mo/Si multilayers with the same periodic length and different periodic number were prepared by magnetron sputtering, whose top layers were respectively Mo layer and Si layer. Periodic length and interface roughness of Mo/Si multilayers were determined by small angle X-ray diffraction (SAXRD). Surface roughness change curve of Mo/Si multilayer with increasing layer number was studied by atomic force microscope (AFM). Soft X-ray reflectivity of Mo/Si multilayers was measured in National Synchrotron Radiation Laboratory (NSRL). Theoretical and experimental results show that the soft X-ray reflectivity of Mo/Si multilayer is mainly determined by periodic number and interface roughness, surface roughness has little effect on reflectivity.

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