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  • Received: Oct. 16, 2017

    Accepted: Dec. 22, 2017

    Posted: Jan. 17, 2019

    Published Online: Jul. 13, 2018

    The Author Email: Yanqiu Li (liyanqiu@bit.edu.cn)

    DOI: 10.3788/COL201816.030801

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    Shanshan Mao, Yanqiu Li, Jiahua Jiang, Shihuan Shen, Ke Liu, Meng Zheng. Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces[J]. Chinese Optics Letters, 2018, 16(3): 030801

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Chinese Optics Letters, Vol. 16, Issue 3, 030801 (2018)

Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces

Shanshan Mao, Yanqiu Li*, Jiahua Jiang, Shihuan Shen, Ke Liu, and Meng Zheng

Author Affiliations

  • Key Laboratory of Photoelectron Imaging Technology and System of the Ministry of Education, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China

Abstract

We have proposed and developed a design method of a freeform surfaces (FFSs) based hyper-numerical-aperture deep ultraviolet (DUV) projection objective (PO) with low aberration. With an aspheric initial configuration, lens-form parameters were used to determine the best position to remove elements and insert FFSs. The designed FFSs PO reduced two elements without increasing the total thickness of the glass materials. Compared with aspheric initial configuration, the wavefront error of the FFSs PO decreased from 0.006λ to 0.005λ, the distortion reduced from 1 to 0.5 nm, and the aspheric departure decreased from 1.7 to 1.35 mm. The results show that the design method of the FFSs PO is efficient and has improved the imaging performance of PO. The design method of FFSs PO provides potential solutions for DUV lithography with low aberrations at 10–5 nm nodes.