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  • Received: Jun. 15, 2020

    Accepted: Jul. 15, 2020

    Posted: Nov. 1, 2020

    Published Online: Oct. 17, 2020

    The Author Email: Li Sikun (, Wang Xiangzhao (

    DOI: 10.3788/AOS202040.2122001

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    Lufeng Liao, Sikun Li, Xiangzhao Wang, Libin Zhang, Shuang Zhang, Pengzheng Gao, Yayi Wei, Weijie Shi. Critical Pattern Selection Based on Diffraction Spectrum Analysis for Full-Chip Source Mask Optimization[J]. Acta Optica Sinica, 2020, 40(21): 2122001

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Acta Optica Sinica, Vol. 40, Issue 21, 2122001 (2020)

Critical Pattern Selection Based on Diffraction Spectrum Analysis for Full-Chip Source Mask Optimization

Liao Lufeng1,2, Li Sikun1,2,*, Wang Xiangzhao1,2,**, Zhang Libin2,3, Zhang Shuang2,3, Gao Pengzheng2,3, Wei Yayi2,3, and Shi Weijie4

Author Affiliations

  • 1Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Integrated Circuit Advanced Process R & D Center, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China;
  • 4Dongfang Jingyuan Electron Limited, Beijing 100176, China


In this paper, a critical pattern selection method for full-chip source mask optimization is proposed. The critical frequency of the pattern represents the characteristics of the pattern. The location and contour information of critical frequency are used to describe the distribution characteristics of the critical frequency in the frequency domain. The corresponding critical frequency extraction method, covering rules, grouping method, and critical pattern selection method are designed to realize the critical pattern selection of the full-chip source mask optimization. Commercial computational lithography software Tachyon of ASML company is used for simulation verification. The comparison with the similar technique of ASML company shows that the process window obtained by this method is better than the ASML Tachyon method.


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