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Eighty won Excellent Reviewers of Chinese Laser Press in 2019

  • optical
  • Apr. 22, 2020

Chinese Laser Press (CLP) has recently released the list of excellent reviewers in 2019. 80 reviewers are applauded for their reviewing quality, quantity, timeliness, and other contributions.

In 2019, thousands of reviewers at home and abroad participated in the manuscript review of CLP published or co-published journals, and they provided a large number of review comments with academic value for authors and guaranteed the efficiency and high-quality selection of excellent submissions.

Here, CLP expresses its sincerest thanks to all reviewers for their valuable work!

The list of excellent reviewers of CLP in 2019 is as follows (listed by alphabet):

Yu Bai, Institute of Optics and Electronics, Chinese Academy of Sciences, China 
Yumei Bao, Zhejiang University of Technology, China
Guangyu Bo, Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, China
Seung-Whan Bahk, University of Rochester, United States
Xiaoshu Cai, University of Shanghai for Science and Technology, China
Yanmin Cai, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, China
Zhiping Cai, Xiamen University, China
Zhengcai Cao, Beijing University of Chemical Technology, China
Feng Chen, Xi 'an Jiaotong University, China
Xijiang Chen, Wuhan University of Technology, China
Dongyin Cui, Xi 'an Jiaotong University, China
Zihao Chen, Washington University in Saint Louis, United States
Zhihua Ding, Zhejiang University, China
Guangyan Dong, Zhongyuan Institute of Electronic Technology, China
Jun Dong, Xiamen University, China
Jiangbing Du, Shanghai Jiaotong University, China
Wei Dou, University of Arkansas, United States
Bin Feng, Northwestern Polytechnical University, China
Shiyao Fu, Beijing Institute of Technology, China
Xinghu Fu, Yanshan University, China
Shaoyan Gai, Southeast University, China
Hailiang Gao, Institute of Remote Sensing and Digital Earth, Chinese Academy of Sciences, China
Yonglei Gui, the 49th Research Institute of China Electronics Technology Group Corporation, China
Xiuli He, Institute of Mechanics, Chinese Academy of Sciences, China
Zhanyi Hu, Institute of automation, Chinese Academy of Sciences, China
Zhixiong Hu, National Institute of Metrology, China
Anguo Huang, Huazhong University of Science and Technology, China
Yujing Huo, Tsinghua University, China
Tian Jiang, National University of Defense Technology, China
Yanyi Jiang, East China Normal University, China
Xuefeng Jiang, Washington University in Saint Louis, United States
Junke Jiao, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, China
Shuming Jiao, Shenzhen University, China
Wei Jin, Ningbo University, China
Youlun Ju, Harbin Institute of Technology, China
Mei Kong, Changchun University of Science and Technology, China
Hiromitsu Kiriyama, National Institutes for Quantum and Radiological Science and Technology, Japan
Josef Krasa, Institute of Physics, AS CR, Czech Republic
Felix Koch, Carl Zeiss Jena GmbH, Germany
Zhenglong Lei, Harbin Institute of Technology, China
Huafeng Li, Kunming University of Science and Technology, China
Junfeng Li, Zhejiang Sci-tech University, China
Xinzhong Li, Henan University of Science and Technology, China
Changsheng Li, Beijing University of Aeronautics and Astronautics, China
Jian Liang,  Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, China
Wei Lu, Harbin Institute of Technology, China
Xiangang Luo, Institute of Optics and Electronics, Chinese Academy of Sciences, China
Guangyi Ma, Dalian University of Technology, Chinese Academy of Sciences, China
Chengbo Mou, Shanghai University, China
Gennady M. Mikheev, Institute of Computational Modelling SB RAS, Russia
Yang Ran, Ji'nan University, China
Kebin Shi, Peking University, China
Jun Song, Shenzhen University, China
Haiqing Song, Harbin Institute of Technology (Shenzhen) , China
Zhengxun Song, Changchun University of Science and Technology, China
Xian Sun, Institute of Electronics, Chinese Academy of Sciences, China
Venugopal Rao Soma, University of Hyderabad, India
Xin Shen, University of Connecticut, United States
Shaohua Tao, Central South University, China
Liping Wang, Nanjing University of Science and Technology, China
Peng Wang, Tianjin University, China
Fuyong Wang, Hebei University of Engineering, China
Haiguang Wang, China Agricultural University, China
Yin Wang, Laser Institute, Shandong Academy of Sciences, China   
Yonghong Wang, Hefei University of Technology, China 
Zhanshan Wang, Tongji University, China
Suming Weng, Shanghai Jiaotong University, China
Changqing Xie, Institute of Electronics, Chinese Academy of Sciences, China
Xinlong Xu, Institute of Photonics & Photon-Technology, Northwest University, China
Bin Xu, Beijing Institute of Remote Sensing Information, China
Hongli Xu, Beijing Jiaotong University, China
Wenrui Xue, Shanxi University, China
Jinping Yao, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, China
Hao Zhang, Nankai University, China
Heng Zhang, Anhui Agricultural University, China
Yupeng Zhang, Shenzhen University, China
Zhirong Zhang, Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, China
Baochang Zhao, Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, China
Chengliang Zhao, Soochow University, China
Luming Zhao, Jiangsu Normal University, China

 

About CLP Journals

Acta Optica Sinica, Chinese journal, EI indexed;

Advanced Photonics, English journal, co-published by SPIE, newly launched;

Chinese Journal of Lasers, Chinese journal, EI indexed;

Chinese Optics Letters, English journal, co-published by OSA, SCI indexed;

High Power Laser Science and Engineering, English journal, co-published by Cambridge University Press, SCI indexed;

Laser & Optoelectronics Progress, Chinese core journal, Scopus indexed;

Photonics Research, English journal, co-published by OSA, SCI indexed;

OE Product & News, Direct mail magazine, Free for read.